Systems
944 System
ELAS System
R&D System
Asher System
Materials
Sputtering Targets and
Evaporation Materials
Target Bonding
Backing Plates
Fabrication and Quality
Control
General Materials List
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ELAS System
Cassette to Cassette operation for 4”, 6” and 8” wafers. Using industry standard Brooks robot system.
Features
- ESC Large Area Sputter
- Dual level load lock
- CTI 10” cryo pump on chamber as standard
- CTI 8” cryo, turbo pump or rotary pump available on load lock
- 3 Target plus RF etch station as standard
- Dual level load lock
- Through wall mounting for very small cleanroom footprint
- Large area substrate
- Up to 400mm X 420mm
- 4 200mm WAFERS
- 6 150mm WAFERS
Contact us today!
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